The Extreme Engineering of ASML’s EUV Light Source
发布时间 2021-12-27 07:00:15 来源
摘要
After 20+ years of development, extreme ultraviolet lithography has become a commercial reality. As I write these words, multi-million dollar machines from ASML use EUV light to create impossibly small patterns in wafers.
This technological magic requires a powerful heart inside of it. And indeed, there is an amazing system driving ASML's $150 million lithography machine: The EUV Light Source.
In this video, we are going to look at the lasers firing pulses at tin droplets to create the powerful, 13.5 nanometer wavelength light for our latest, greatest microprocessors.
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